The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Jul. 26, 2019
Applicant:

The University of Tokyo, Tokyo, JP;

Inventors:

Yoshihiro Watanabe, Tokyo, JP;

Masatoshi Ishikawa, Tokyo, JP;

Konosuke Kachi, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/57 (2006.01); G01N 21/47 (2006.01);
U.S. Cl.
CPC ...
G01N 21/57 (2013.01); G01N 21/47 (2013.01); G01N 2021/4711 (2013.01); G01N 2021/4735 (2013.01);
Abstract

A reflection characteristic measurement device is provided that comprises: a control unit configured to measure a reflection characteristic of an object based on target information and instruction information, wherein: the target information is information including a coordinate positional relationship among a light source position of an incident light, a light detection position of a reflected light and a measurement point at the object, and numerical values related to the incident light and the reflected light, the incident light is light irradiated to the measurement point, the reflected light is light that the incident light is irradiated to the measurement point and then reflected at the measurement point, the instruction information is information related to an existing measurement result of the reflection characteristic, and the number of combinations of the coordinate positional relationship included in the target information is 1 to 15.


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