The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Apr. 01, 2021
Applicant:
Sumco Corporation, Tokyo, JP;
Inventor:
Naoyuki Wada, Tokyo, JP;
Assignee:
SUMCO CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/16 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); C30B 25/10 (2006.01); C30B 35/00 (2006.01);
U.S. Cl.
CPC ...
C30B 25/165 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C30B 25/10 (2013.01); C30B 25/16 (2013.01); C30B 35/00 (2013.01);
Abstract
For correction of a source gas supply time and a dopant gas flow rate, a calculation unit in an epitaxial wafer production system performs not only correction based on a result of comparing measured thickness and resistivity of an epitaxial film respectively with a target thickness range and a target resistivity range, but also correction based on a variation in total output value of upper and lower lamps.