The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Feb. 08, 2021
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Do Young Ha, Daejeon, KR;
Won Sang Kwon, Daejeon, KR;
Jung Eun Kim, Daejeon, KR;
Jung Su Han, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 15/00 (2006.01); C08C 19/04 (2006.01); B29C 41/00 (2006.01); B29C 41/14 (2006.01); B29K 19/00 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
C08L 15/00 (2013.01); C08C 19/04 (2013.01); B29C 41/003 (2013.01); B29C 41/14 (2013.01); B29K 2019/00 (2013.01); B29K 2105/0085 (2013.01); C08L 2201/52 (2013.01); C08L 2312/00 (2013.01);
Abstract
Disclosed is a latex composition for dip molding including a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formula 1, wherein the carboxylic acid-modified nitrile-based copolymer includes: 15 wt % to 30 wt % of the ethylenic unsaturated nitrile-based monomer-derived unit and 2.5 wt % to 4.5 wt % of the ethylenic unsaturated acid monomer-derived unit, and a molded article:1.0 mm/s≤CV≤3.0 mm/s. General Formula 1