The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Sep. 10, 2020
Applicant:
Tokyo University of Science Foundation, Tokyo, JP;
Inventor:
Koji Arimitsu, Tokyo, JP;
Assignee:
Tokyo University of Science Foundation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/50 (2006.01); C08F 122/10 (2006.01); C07C 59/11 (2006.01); C07C 69/732 (2006.01); C07C 279/04 (2006.01); C07C 279/22 (2006.01); C07D 233/06 (2006.01); C07D 295/185 (2006.01); C07D 311/86 (2006.01); C08G 59/50 (2006.01);
U.S. Cl.
CPC ...
C08F 2/50 (2013.01); C07C 59/11 (2013.01); C07C 69/732 (2013.01); C07C 279/04 (2013.01); C07C 279/22 (2013.01); C07D 233/06 (2013.01); C07D 295/185 (2013.01); C07D 311/86 (2013.01); C08F 122/1006 (2020.02); C08G 59/5046 (2013.01);
Abstract
A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.