The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Sep. 29, 2020
Applicant:

Sodick Co., Ltd., Kanagawa, JP;

Inventors:

Atsushi Kawamura, Kanagawa, JP;

Kensuke Kashimura, Kanagawa, JP;

Toshio Kaji, Kanagawa, JP;

Yoshifumi Ichikawa, Kanagawa, JP;

Yasuyuki Miyashita, Kanagawa, JP;

Assignee:

Sodick Co., Ltd., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 12/49 (2021.01); B29C 64/277 (2017.01); B23K 26/082 (2014.01); B22F 10/00 (2021.01); B22F 12/00 (2021.01); B22F 10/28 (2021.01); B22F 12/44 (2021.01); B33Y 30/00 (2015.01); B22F 12/41 (2021.01); B22F 12/45 (2021.01); B22F 12/67 (2021.01); B22F 10/32 (2021.01);
U.S. Cl.
CPC ...
B29C 64/277 (2017.08); B22F 10/00 (2021.01); B22F 10/28 (2021.01); B22F 12/38 (2021.01); B22F 12/44 (2021.01); B22F 12/49 (2021.01); B23K 26/0821 (2015.10); B22F 10/32 (2021.01); B22F 12/41 (2021.01); B22F 12/45 (2021.01); B22F 12/67 (2021.01); B33Y 30/00 (2014.12);
Abstract

An irradiation device of a lamination molding apparatus includes: at least one laser source, generating a laser beam; a first galvano scanner, scanning the laser beam; a second galvano scanner, scanning the laser beam; and an irradiation controller, controlling the laser source, the first galvano scanner, and the second galvano scanner. Irradiable ranges of the laser beams by using the first galvano scanner and the second galvano scanner respectively include an entire of a molding region. A first X-axis galvano mirror and a first Y-axis galvano mirror of the first galvano scanner and a second X-axis galvano mirror and a second Y-axis galvano mirror of the second galvano scanner are disposed to be plane-symmetric to each other.


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