The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Nov. 05, 2019
Ecole Polytechnique Federale DE Lausanne (Epfl), Lausanne, CH;
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL), Lausanne, CH;
Abstract
Photoresponsive materials for use with a volumetric additive manufacturing system are described herein. Some embodiments of photoresponsive materials described herein include at least one constituent selected from the group consisting of (i) a thiol-containing siloxane prepolymer, (ii) a vinyl-containing siloxane prepolymer, (iii) a reinforcing filler, (iv) a photoinitiator (v) a polymerization inhibitor. Various methods of using the same photoresponsive materials in additive manufacturing processes, such as volumetric additive manufacturing, are also described.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile