The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Feb. 04, 2021
Applicant:

Loci Controls, Inc., Wareham, MA (US);

Inventors:

Peter Quigley, Duxbury, MA (US);

Ian Martin, Sharon, MA (US);

Joseph G. Michels, New York, NY (US);

Melinda Sims, Seattle, WA (US);

Assignee:

Loci Controls, Inc., Wareham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B09B 1/00 (2006.01); G01N 33/00 (2006.01); E21B 43/12 (2006.01); H05B 3/22 (2006.01); G01N 1/22 (2006.01);
U.S. Cl.
CPC ...
B09B 1/006 (2013.01); B09B 1/00 (2013.01); E21B 43/12 (2013.01); G01N 1/2294 (2013.01); G01N 33/0016 (2013.01); H05B 3/22 (2013.01); Y02W 30/30 (2015.05);
Abstract

A control system for controlling extraction of landfill gas from a landfill via a gas extraction system comprising well piping, the landfill gas having a first temperature when extracted, the control system comprising: a gas composition chamber coupled to the well piping and comprising at least one sensor configured to measure one or more characteristics of a landfill gas sample in the gas composition chamber; a temperature control mechanism configured to heat the landfill gas sample in the gas composition chamber to a second temperature at least a threshold amount greater than the first temperature; and a controller configured to control the at least one sensor to measure the one or more characteristics of the landfill gas sample in the gas composition chamber when a temperature of the landfill gas sample in the gas composition chamber is at least the threshold amount greater than the first temperature.


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