The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Jun. 03, 2022
Applicant:
Milaebo Co., Ltd., Pyeongtaek-si, KR;
Inventors:
Che Hoo Cho, Seoul, KR;
Yeon Ju Lee, Osan-si, KR;
Jun Min Lee, Osan-si, KR;
Ji Eun Han, Pyeongtaek-si, KR;
Assignee:
MILAEBO CO., LTD., Pyeongtaek-si, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 45/08 (2006.01); B01D 50/20 (2022.01); B01D 45/16 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
B01D 50/20 (2022.01); B01D 45/08 (2013.01); B01D 45/16 (2013.01); C23C 16/4412 (2013.01);
Abstract
The present disclosure relates to an apparatus for trapping of a reaction by-product with an extended available collection area. The configuration of the present disclosure relates to an apparatus for trapping of a reaction by-product, which is configured to accommodate gas, which is discharged after a deposition process during a semiconductor manufacturing process, in a housing (), heat the gas with a heater (), trap a reaction by-product contained in the gas by using an internal trapping tower (), and discharge only the gas.