The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Sep. 02, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Rajesh Kumar Putti, Singapore, SG;

Vinodh Ramachandran, Singapore, SG;

Ananthkrishna Jupudi, Singapore, SG;

Lean Wui Koh, Singapore, SG;

Prashant Agarwal, Singapore, SG;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03F 1/52 (2006.01); H01S 3/041 (2006.01); H01S 3/067 (2006.01); H01S 3/042 (2006.01); H01S 3/23 (2006.01);
U.S. Cl.
CPC ...
H01S 3/041 (2013.01); H01S 3/042 (2013.01); H01S 3/06779 (2013.01); H01S 3/06783 (2013.01); H01S 3/2308 (2013.01);
Abstract

Methods and apparatus for processing a substrate. For example, a processing chamber can include a power source, an amplifier connected to the power source, comprising at least one of a gallium nitride (GaN) transistor or a gallium arsenide (GaAs) transistor, and configured to amplify a power level of an input signal received from the power source to heat a substrate in a process volume, and a cooling plate configured to receive a coolant to cool the amplifier during operation.


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