The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Apr. 29, 2020
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Jun Keon Ahn, Sejong-si, KR;

Soo Young Park, Incheon, KR;

Ohyeol Kwon, Cheonan-si, KR;

Jung Hwan Lee, Pyeongtaek-si, KR;

Seungtae Yang, Yongin-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B23K 26/40 (2014.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 7/00 (2006.01); B23K 26/08 (2014.01); B23K 26/0622 (2014.01); B23K 26/073 (2006.01); B23K 26/06 (2014.01); B23K 26/082 (2014.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02098 (2013.01); B08B 7/0042 (2013.01); B23K 26/0604 (2013.01); B23K 26/0622 (2015.10); B23K 26/0648 (2013.01); B23K 26/0665 (2013.01); B23K 26/073 (2013.01); B23K 26/082 (2015.10); B23K 26/0823 (2013.01); H01L 21/02087 (2013.01); H01L 21/67115 (2013.01); H01L 21/68764 (2013.01); B23K 2101/40 (2018.08);
Abstract

An apparatus and system for treating a substrate includes a chamber having an inner space, a support unit in the inner space and configured to support and rotate the substrate, and first and second laser irradiation unit configured to irradiate first and second laser beams onto the substrate. The first laser irradiation unit includes a first laser light source configured to generate the first laser beam, and a first wavelength adjusting member configured to adjust a range of a wavelength of the first laser beam received from the first laser light source. The second laser beam, and a second wavelength adjusting member configured to adjust a range of a wavelength of the second laser beam received from the second laser light source.


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