The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
Feb. 25, 2022
Applicant:
Innolux Corporation, Miao-Li County, TW;
Inventors:
Chien-Hsing Lee, Miao-Li County, TW;
Chin-Lung Ting, Miao-Li County, TW;
Jung-Chuan Wang, Miao-Li County, TW;
Hong-Sheng Hsieh, Miao-Li County, TW;
Assignee:
INNOLUX CORPORATION, Miao-Li County, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/60 (2013.01);
Abstract
A method for forming a target substrate is provided. The method includes providing a mask substrate. The method also includes providing a second base with a material layer. The method further includes arranging the mask substrate and the second base correspondingly. In addition, the method includes performing exposure and development processes on the material layer to form the target substrate and removing the mask substrate.