The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

May. 29, 2018
Applicant:

Oerlikon Metco Ag, Wohlen, Wohlen, CH;

Inventors:

Martin Stoeckli, Boswil, CH;

Alexander Paul Michla, Wohlen, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); B33Y 80/00 (2015.01); C23C 16/04 (2006.01); C23C 16/513 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45563 (2013.01); B33Y 80/00 (2014.12); C23C 16/045 (2013.01); C23C 16/513 (2013.01);
Abstract

The invention relates to a coating lance for a plasma process, the lance comprising a plasma shaft, a plasma neck, and a plasma head, the plasma shaft comprising a longitudinal channel, which extends in an axial direction along an axis from a first shaft end to a second shaft end, the plasma neck comprising a shaft boss and a head boss and at least one neck channel, which extends from the shaft boss to the head boss, and the shaft boss being arranged on the second shaft end in such a way that the longitudinal channel leads into the at least one neck channel, the plasma head comprising a neck boss, a plasma opening, and at least one head channel, which extends from the neck boss to the plasma opening, and the neck boss of the plasma head being arranged on the head boss of the plasma neck in such a way that the at least one neck channel leads into the head channel. The course of the plasma channel deviates from the axis in such a way that the neck channel leads into the head channel eccentrically with respect to the axis, i.e. at an offset to the axis.


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