The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Feb. 25, 2021
Applicant:

Kraton Polymers Llc, Houston, TX (US);

Inventors:

Kathryn Wright, Houston, TX (US);

Vijay Mhetar, Houston, TX (US);

Bert Krutzer, Amsterdam, NL;

Assignee:

KRATON CORPORATION, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 6/28 (2006.01); C08F 293/00 (2006.01); C08F 118/08 (2006.01); C08G 65/38 (2006.01);
U.S. Cl.
CPC ...
C08F 6/28 (2013.01); C08F 118/08 (2013.01); C08F 293/00 (2013.01); C08G 65/38 (2013.01);
Abstract

A method to purify a polymer is disclosed. The method is part of a manufacturing process wherein a virgin polymer is produced from a polymerization process employing at least a monomer or a comonomer as a feedstock. The monomer or the comonomer is selected from the group consisting of organic polar monomers, inorganic monomers, vinyl aromatic monomers, conjugated dienes, and mixtures thereof. In the method, the polymer in solid, liquid or molten state is brought into contact with a fluid solvent or an extraction fluid in a supercritical state or near supercritical state. The contact is at controlled temperature and pressure, allowing the fluid solvent to diffuse into the polymer and extract the impurities intended to remove. The method can be used to remove at least 10%, or at least 20%, or at least 50% of the target impurity from the polymer.


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