The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
Mar. 16, 2021
Tongji University, Shanghai, CN;
Fengting Li, Shanghai, CN;
TONGJI UNIVERSITY, Shanghai, CN;
Abstract
A device for continuous production of polyferric chloride and a method are disclosed. The device includes a first mixing pipeline, a second reaction pipeline, a third reaction pipeline, and a concentration device sequentially connected. The first mixing pipeline, the second reaction pipeline and the third reaction pipeline are each provided with a circulating spray device, and the circulating spray device includes a reflux pump, a reflux pipeline and an atomizer. The atomizer includes an atomizing pipe, and a chemical filler plate for promoting gas-liquid contact is arranged below the atomizing pipe. The reflux pump is used to extract liquid from each reaction tank, and then transport the liquid to the atomizer on the top of the reaction tank. The atomizer is driven by the pressure of the reflux pump or the motor to atomize the liquid.