The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
Aug. 19, 2020
Fujifilm Business Innovation Corp., Tokyo, JP;
Yuka Zenitani, Minamiashigara, JP;
Koji Sasaki, Minamiashigara, JP;
Sakae Takeuchi, Minamiashigara, JP;
Yoshifumi Eri, Minamiashigara, JP;
Takahiro Mizuguchi, Minamiashigara, JP;
FUJIFILM Business Innovation Corp., Tokyo, JP;
Abstract
A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90≤F/F≤1.10, and 5≤F/F≤20, in which Frepresents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, Frepresents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and Frepresents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600° C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.