The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Sep. 08, 2021
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Toshiba Energy Systems & Solutions Corporation, Kawasaki, JP;

Inventors:

Yasuhiro Kato, Kawasaki Kanagawa, JP;

Mitsuru Udatsu, Kawasaki Kanagawa, JP;

Daigo Muraoka, Kawasaki Kanagawa, JP;

Hayato Morigaki, Yokohama Kanagawa, JP;

Shinji Murai, Sagamihara Kanagawa, JP;

Koshito Fujita, Yokohama Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/14 (2006.01); B01D 53/77 (2006.01);
U.S. Cl.
CPC ...
B01D 53/1406 (2013.01); B01D 53/1425 (2013.01); B01D 53/1468 (2013.01); B01D 53/1475 (2013.01); B01D 53/77 (2013.01); B01D 2251/206 (2013.01); B01D 2257/304 (2013.01); B01D 2257/504 (2013.01);
Abstract

In one embodiment, an acid gas removing apparatus includes an absorber configured to bring a first gas including an acid gas and a lean solution into contact to discharge a rich solution that is the lean solution having absorbed the acid gas, a regenerator configured to separate the acid gas from the rich solution discharged by the absorber to discharge the lean solution that is the rich solution separated from the acid gas, and a measuring instrument configured to measure a temperature of the rich or lean solution in the regenerator. Furthermore, an acid gas removal control apparatus that controls the acid gas removing apparatus includes a receiver configured to receive the measured temperature, and a controller configured to control resupply of a resupplied solution to the rich or lean solution or removal of an acid component from the rich or lean solution, based on the received temperature.


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