The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
Jun. 21, 2023
Xiamen University, Xiamen, CN;
Shanghai University, Shanghai, CN;
Gang Liu, Xiamen, CN;
Xiao Xu, Xiamen, CN;
Hongjuan Ma, Shanghai, CN;
Zhenwen Zhao, Xiamen, CN;
Hu Chen, Xiamen, CN;
Pan He, Xiamen, CN;
Chao Liu, Xiamen, CN;
Chengchao Chu, Xiamen, CN;
Dong Li, Xiamen, CN;
Xiamen University, Xiamen, CN;
Shanghai University, Shanghai, CN;
Abstract
An engineered radioactive polymeric microsphere, and a preparation and application thereof. The preparation method includes: adding a styrene monomer and a disperser and/or a crosslinker into a medium, followed by feeding of nitrogen or helium and stirring to obtain a first reaction mixture; heating the first reaction mixture, and adding an initiator, followed by reaction under stirring at a constant temperature to obtain a second reaction mixture; subjecting the second reaction mixture to washing with ethanol and water, and vacuum drying to obtain a crude polymeric microsphere; subjecting the crude polymeric microsphere to radiation-induced graft polymerization with a functional monomer to obtain the functionalized polymeric microsphere; and exposing the functionalized polymeric microsphere to a radionuclide to prepare the engineered radioactive polymeric microsphere.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile