The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Feb. 19, 2021
Applicant:

Koninklijke Philips N.v., Eindhoven, NL;

Inventors:

Bastiaan Johannes De Wit, Nuis, NL;

Matthijs Hendrikus Lubbers, Lieveren, NL;

Pieter Kingma, Drachten, NL;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A47L 11/20 (2006.01); A47L 7/00 (2006.01); A47L 11/30 (2006.01); A47L 11/40 (2006.01); A47L 9/06 (2006.01);
U.S. Cl.
CPC ...
A47L 11/201 (2013.01); A47L 7/009 (2013.01); A47L 9/0686 (2013.01); A47L 11/30 (2013.01); A47L 11/4044 (2013.01); A47L 11/4083 (2013.01); A47L 11/4088 (2013.01); A47L 11/4094 (2013.01);
Abstract

A cleaning device comprises a surface interaction layer (ML), a cleaning fluid supply (CFF) provided with a cleaning fluid channel (CFC) at the surface interaction layer (ML) for supplying a cleaning fluid to a surface (F) through the surface interaction layer (ML) being in contact with the surface (F), and a dirty fluid drain (DFD) having a dirty fluid channel (DFC) at the surface interaction layer (ML) for draining, by means of underpressure, dirty water from the surface (F) through the surface interaction layer (ML) being in contact with the surface (F).


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