The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Aug. 24, 2020
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Ryo Tanaka, Hino, JP;

Shinya Takashima, Hachioji, JP;

Hideaki Matsuyama, Hino, JP;

Katsunori Ueno, Matsumoto, JP;

Masaharu Edo, Tokorozawa, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/20 (2006.01); H01L 21/20 (2006.01); H01L 21/265 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); H01L 21/20 (2013.01); H01L 21/265 (2013.01); H01L 29/0684 (2013.01); H01L 29/16 (2013.01); H01L 29/66734 (2013.01); H01L 29/7802 (2013.01);
Abstract

A nitride semiconductor device is provided, comprising: a first nitride semiconductor layer of a first conductivity-type; a second nitride semiconductor layer of a second conductivity-type provided above the first nitride semiconductor layer; a junction region of a first conductivity-type which is provided to extend in a direction from a front surface of the second nitride semiconductor layer to the first nitride semiconductor layer and has a doping concentration Nequal to or higher than that of the first nitride semiconductor layer; and a source region of a first conductivity-type which is provided more shallowly than the junction region and has a doping concentration equal to or higher than the doping concentration N, wherein a dopant of the source region is an element with an atomic weight larger than that of a dopant in the junction region.


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