The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Dec. 22, 2020
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Mostafa El-Khamy, San Diego, CA (US);
Jungwon Lee, San Diego, CA (US);
Haoyu Ren, San Diego, CA (US);
Samsung Electronics Co., Ltd, , KR;
Abstract
Method and systems are provided for robust disparity estimation based on cost-volume attention. A method includes extracting first feature maps from left images captured by a first camera; extracting second feature maps from right images captured by a second camera; calculating a matching cost based on a comparison of the first and second feature maps to generate a cost volume; generating an attention-aware cost volume from the generated cost volume; and aggregating the attention-aware cost volume to generate an output disparity.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile