The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Apr. 13, 2021
Applicant:
Meta Platforms Technologies, Llc, Menlo Park, CA (US);
Inventors:
Mengfei Wang, Kirkland, WA (US);
Junren Wang, Kirkland, WA (US);
Yun-Han Lee, Redmond, WA (US);
Stephen Choi, Seattle, WA (US);
Lu Lu, Kirkland, WA (US);
Barry David Silverstein, Kirkland, WA (US);
Assignee:
META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/12 (2006.01); G03H 1/04 (2006.01); G02B 27/28 (2006.01); G03H 1/02 (2006.01);
U.S. Cl.
CPC ...
G03H 1/0402 (2013.01); G02B 27/286 (2013.01); G03H 1/0248 (2013.01); G03H 1/0465 (2013.01); G03H 2001/0216 (2013.01); G03H 2001/0413 (2013.01); G03H 2001/0439 (2013.01); G03H 2001/0441 (2013.01); G03H 2223/20 (2013.01); G03H 2223/22 (2013.01); G03H 2223/23 (2013.01); G03H 2223/24 (2013.01); G03H 2227/05 (2013.01);
Abstract
A system includes a mask configured to forwardly diffract an input beam as a first set of two polarized beams. The system also includes a polarization conversion element configured to convert the first set of two polarized beams into a second set of two polarized beams having opposite handednesses. The two polarized beams having opposite handednesses interfere with one another to generate a polarization interference pattern.