The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Feb. 08, 2022
Nalux Co., Ltd., Osaka, JP;
Jumpei Oda, Osaka, JP;
Tomohito Kuwagaito, Osaka, JP;
NALUX CO., LTD., Osaka, JP;
Abstract
A method for manufacturing optical scanning systems by which plural optical scanning systems with different effective scanning widths can be manufactured by changing a polygon mirror alone is provided. The method includes the steps of designing a first scanning optical system using a first polygon mirror corresponding to a first value of effective scanning width; designing a second scanning optical system provided with a second polygon mirror corresponding to a second value of effective scanning width, the second value being smaller than the first value, wherein a reference point of deflection is located at the position of the reference point of deflection of the first scanning optical system; and adjusting a size and a position of the scanning lens so as to adjust a lateral magnification in a cross section in the sub-scanning direction of the imaging optical system.