The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Mar. 18, 2021
Applicant:

Leica Instruments (Singapore) Pte. Ltd., Singapore, SG;

Inventor:

Gao Yang, Singapore, SG;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/08 (2006.01); G02B 21/12 (2006.01);
U.S. Cl.
CPC ...
G02B 21/082 (2013.01); G02B 21/12 (2013.01);
Abstract

Examples relate to an illumination system for a microscope system, and to a system, method and computer program for a microscope system. The illumination system includes an illumination module for providing a spatially modulated illumination of a sample. The illumination system further includes one or more processors configured to determine a depth characteristic of the sample. The one or more processors is configured to control the illumination module based on the depth characteristic of the sample.


Find Patent Forward Citations

Yang, Gao. (2024). Illumination system, system, method and computer program for a microscope system (U.S. Patent No. 11860351). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11860351

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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