The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Mar. 31, 2022
Corning Incorporated, Corning, NY (US);
Ryan Claude Andrews, Elmira, NY (US);
Pierre Michel Bouzi, Horseheads, NY (US);
William John Furnas, Elmira, NY (US);
Jacob Immerman, Corning, NY (US);
Jeremiah Robert Jacobson, Corning, NY (US);
Katherine Anne Lindberg, Corning, NY (US);
Evan Lewis Olson, Elmira, NY (US);
Nathaniel David Wetmore, Corning, NY (US);
CORNING INCORPORATED, Corning, NY (US);
Abstract
Systems and methods of performing a stress measurement of a chemically strengthened glass using a light-scattering polarimetry system include adjusting the intensity of a light beam from a light source in an illumination system using a rotatable half-wave plate and a first polarizer operably disposed between the light source and a rotating light diffuser that has a rotation time t. The first polarizer is aligned with a second polarizer in a downstream optical compensator to have matching polarization directions by rotating the rotatable half-wave plate to a position where the exposure time tfalls within an exposure range t≤t. The method also includes performing an exposure using the exposure time tto obtain the stress measurement. One or both of the half-wave plate and first polarizer can be tilted to avoid deleterious back-reflected light from entering the light source.