The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Sep. 03, 2020
Valmet Technologies Oy, Espoo, FI;
Jorma Naamanka, Espoo, FI;
Juha Nieminen, Espoo, FI;
Valmet Technologies Oy, Espoo, FI;
Abstract
A fabric for a paper or pulp technology has a longitudinal direction (MD) and a cross direction (CMD), and a first surface (FS) and a second surface (SS) in a fabric thickness direction (TD). The fabric () extends in the cross direction (CMD) from a first edge (FG) to a second edge (SG). The fabric () has an adaptable medium comprising at least one sensor. The adaptable medium is a deformable structure that adapts to the fabric where it is inserted and may be a string or a sheet configured to detect temperature, temperature profile, wear, volatile organic compounds (VOC), humidity, pH, microbial level, organic and inorganic material content, dirt content, flow rate and flow velocity field, or pressure in a nip. The invention also relates to a method for manufacturing a fabric for a paper or pulp technology.