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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11859312 B1

PDFFull Text
Date of Patent:
Jan. 02, 2024

Filed:

Aug. 17, 2022

Method of cleaning a group iii-nitride single crystal substrate comprising cleaning a nitrogen-polar face with a detergent including a fluoroorganic compound

Applicant:

Tokuyama Corporation, Shunan, JP;

Inventors:

Masayuki Fukuda, Shunan, JP;

Reo Yamamoto, Shunan, JP;

Assignee:

TOKUYAMA CORPORATION, Shunan, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Kenneth A Bratland, Jr

Int. Cl.
CPC ...
C30B 33/10 (2006.01); C30B 33/00 (2006.01); C30B 29/40 (2006.01); C30B 23/02 (2006.01); C11D 7/24 (2006.01); B08B 3/12 (2006.01); C11D 7/30 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
C30B 33/00 (2013.01); B08B 3/08 (2013.01); B08B 3/12 (2013.01); C11D 7/24 (2013.01); C11D 7/30 (2013.01); C30B 23/02 (2013.01); C30B 29/403 (2013.01);
Abstract

Provided are a method of cleaning a group III nitride single crystal substrate which enables the roughness of a nitrogen-polar face of the group III nitride single crystal substrate to be suppressed to remove foreign substances, and a method of producing a group III nitride single crystal substrate. The method of cleaning a group III nitride single crystal substrate having a group III element-polar face, and the nitrogen-polar face opposite the group III element-polar face includes: cleaning the nitrogen-polar face with a detergent including a fluoroorganic compound.

Find Patent Forward Citations

Quick Actions:

Fukuda, Masayuki. (2024). Method of cleaning a group iii-nitride single crystal substrate comprising cleaning a nitrogen-polar face with a detergent including a fluoroorganic compound (U.S. Patent No. 11859312). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11859312

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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