The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Sep. 18, 2020
Applicant:

Cnbm Research Institute for Advanced Glass Materials Group Co., Ltd., Bengbu, CN;

Inventors:

Lutz Tautenhahn, Dresden, DE;

Robert Heinhold, Fürth, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 27/10 (2006.01); H01L 31/0224 (2006.01); H01L 31/0236 (2006.01); B32B 17/10 (2006.01); H01L 31/0216 (2014.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
C03C 27/10 (2013.01); B32B 17/10018 (2013.01); H01L 31/02165 (2013.01); H01L 31/02366 (2013.01); H01L 31/022466 (2013.01); H01L 31/18 (2013.01); C03C 2218/34 (2013.01); C03C 2218/365 (2013.01);
Abstract

A method for processing a transparent cover plate for a flat body includes the following steps of providing the transparent cover plate having an outer side and an opposite inner side, wherein the transparent cover plate includes a structured area with a light-scattering structure, forming of at least one optical interference layer on a cover plate side including applying a mask to the transparent cover plate, wherein the mask does not cover a first area of a cover plate surface and covers a second area of the cover plate side, and the first area and the second area are arranged to overlap the structured area, the at least one optical interference layer is applied in overlap with the mask, and removing of the mask, whereby the at least one optical interference layer is also removed.


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