The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Dec. 28, 2020
Applicant:

Universities Space Research Association, Mountain View, CA (US);

Inventor:

Ramprasad Gandhiraman, Sunnyvale, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/13 (2023.01); B41J 2/00 (2006.01); H10K 71/60 (2023.01);
U.S. Cl.
CPC ...
H10K 71/13 (2023.02); B41J 2/00 (2013.01); H10K 71/611 (2023.02);
Abstract

Method for high throughput, highly reproducible, direct write plasma jet deposition of organic electronic materials through nozzles containing non-concentric tubes with inner tube having higher dielectric constant and/or higher wall thickness than the outer tube, so that the inner tube containing the aerosol of organic electronic materials is shielded from the outer tube containing plasma and the organic electronics is focused at the outlet of the nozzle through the after-glow region of the atmospheric pressure plasma. Ensuring reproducibility of the method for printing organic electronic materials by removing the contaminants and residues in inner tube using reactive gas and generating a plasma discharge at a potential significantly higher than the operating potential for printing so that the plasma is generated in both the inner and outer tube for dielectric barrier discharge plasma jet based cleaning of the nozzle.


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