The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Sep. 12, 2022
Applicant:

Murata Manufacturing Co., Ltd., Nagaokakyo, JP;

Inventor:

Masakazu Mimura, Nagaokakyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 9/145 (2006.01); H03H 9/02 (2006.01); H03H 9/25 (2006.01); H03H 9/64 (2006.01); H03H 9/72 (2006.01); H04B 1/00 (2006.01); H04B 1/04 (2006.01); H04B 1/50 (2006.01);
U.S. Cl.
CPC ...
H03H 9/145 (2013.01); H03H 9/02559 (2013.01); H03H 9/25 (2013.01); H03H 9/64 (2013.01); H03H 9/6483 (2013.01); H03H 9/725 (2013.01); H04B 1/0057 (2013.01); H04B 1/0475 (2013.01); H04B 1/50 (2013.01); H04B 2001/0408 (2013.01);
Abstract

An elastic wave device includes an LiNbOsubstrate, a first elastic wave resonator including a first IDT electrode and a first dielectric film, and a second elastic wave resonator including a second IDT electrode and a second dielectric film. A Rayleigh wave travels along at least one surface of the elastic wave device. A thickness of the first dielectric film differs from a thickness of the second dielectric film. A propagation direction of an elastic wave in the first elastic wave resonator coincides with a propagation direction of an elastic wave in the second elastic wave resonator. Euler angles of the LiNbOsubstrate fall within a range of (0°±5°, θ, 0°±10°).


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