The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Mar. 31, 2022
Applicant:

Skyworks Solutions, Inc., Irvine, CA (US);

Inventors:

Satoru Matsuda, Toyonaka, JP;

Tatsuya Fujii, Nagaokakyo, JP;

Yoshiro Kabe, Kobe, JP;

Kenji Nagano, Ibaraki, JP;

Assignee:

Skyworks Solutions, Inc., Irvine, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 9/02 (2006.01); H03H 9/25 (2006.01); H03H 9/64 (2006.01); H03H 9/72 (2006.01); H03H 9/145 (2006.01);
U.S. Cl.
CPC ...
H03H 9/02574 (2013.01); H03H 9/02559 (2013.01); H03H 9/02834 (2013.01); H03H 9/02842 (2013.01); H03H 9/14502 (2013.01); H03H 9/14541 (2013.01); H03H 9/25 (2013.01); H03H 9/6406 (2013.01); H03H 9/725 (2013.01);
Abstract

Methods of manufacturing an acoustic wave device are disclosed. An anti-reflection layer can be formed over a conductive layer that is over a piezoelectric layer. The conductive layer can include aluminum, for example. The anti-reflection layer can remain distinct from the conductive layer after a heating process. A photolithography process can pattern an interdigital transducer of the acoustic wave device from one or more interdigital transducer electrode layers that include the conductive layer. The anti-reflection layer can reduce reflection from the conductive layer during the photolithography process.


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