The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Oct. 25, 2019
Applicant:
Seoul National University R&db Foundation, Seoul, KR;
Inventors:
Assignee:
Seoul National University R&DBFoundation, Seoul, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/00 (2006.01); G02B 27/09 (2006.01); G02B 27/10 (2006.01); G02F 1/35 (2006.01); H01S 3/10 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01S 3/0057 (2013.01); G02B 27/0905 (2013.01); G02B 27/10 (2013.01); G02F 1/3503 (2021.01); G02F 1/3505 (2021.01); G02F 1/3507 (2021.01); G02F 1/3511 (2013.01); G02F 1/3515 (2013.01); G02F 1/3523 (2013.01); H01S 3/0085 (2013.01); H05H 1/46 (2013.01); H01S 3/10092 (2013.01);
Abstract
The present disclosure relates to a device and a method for adjusting a pulse width of a laser beam by using the plasma generated by being induced from laser as a shutter, and more particularly, to a device and a method for adjusting a laser pulse width, which can precisely and quickly adjust the laser pulse width by dividing the laser generated from a laser light source into a target pulse and a shutter pulse; converting the optical path of the divided laser; and chopping the target pulse by using the plasma induced from the shutter pulse as an optical shutter in a cell having adjustable internal pressure.