The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Jun. 06, 2019
Applicant:

Amgen Inc., Thousand Oaks, CA (US);

Inventor:

Zhongqi Zhang, Thousand Oaks, CA (US);

Assignee:

Amgen Inc., Thousand Oaks, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); G01N 30/86 (2006.01); G01N 33/68 (2006.01);
U.S. Cl.
CPC ...
H01J 49/0009 (2013.01); G01N 30/8665 (2013.01); G01N 30/8696 (2013.01); H01J 49/0036 (2013.01); G01N 30/86 (2013.01); G01N 33/68 (2013.01);
Abstract

Systems and methods are described for reducing lab-to-lab and/or instrument-to-instrument variability of Multi-Attribute Methods (MAM) analyses via run-time signal intensity calibration. In various aspects, multiple MAM-based instruments each have detectors and different instrument conditions defined by different instrument models or sets of settings. Each MAM-based instrument receives respective samples and a reference standard as a calibrant. Each MAM-based instrument detects, via its detector, sample isoforms of its respective sample and reference standard isoforms of the reference standard. The MAM-based instruments are associated with processor(s) that determine, via respective MAM iterations, correction factors and sample abundance values corresponding to the sample isoforms. The correction factors are based on the reference standard, and the sample abundance values are based on the correction factors. A variance value of the sample abundance values may be reduced based on correction factors of each of the MAM-based instruments.


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