The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Mar. 26, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Yuanhong Guo, Mountain View, CA (US);
Sheng Guo, Santa Clara, CA (US);
Marek Radko, San Jose, CA (US);
Steve Sansoni, Livermore, CA (US);
Xiaoxiong Yuan, San Jose, CA (US);
See-Eng Phan, Santa Clara, CA (US);
Yuji Murayama, Los Gatos, CA (US);
Pingping Gou, San Mateo, CA (US);
Song-Moon Suh, Seoul, KR;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.