The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Jan. 17, 2022
Beihang University, Beijing, CN;
Beihang University, Beijing, CN;
Abstract
The embodiments of the present disclosure disclose subsurface scattering calculation method for translucent material rendering, which relates to the clipping and polynomial fitting of brute-force Monte Carlo photon tracking experimental results to accurately represent the energy attenuation of subsurface scattering in distance. On this basis, an average free path and a single scattering rate are used to determine the relationship of each term in the multinomial fitting formula so as to facilitate the calculation and adjustment of the reflection profile. In the end, through a new real-time importance sampling solution, the outgoing radiation from any point on the object surface is calculated by the Monte Carlo method. This importance sampling solution is also applicable to any other subsurface scattering calculation model. By combining this subsurface scattering calculation result with other results, such as highlight reflection, any translucent material object can be rendered accurately and efficiently.