The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Jul. 22, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Nobuhiro Okai, Tokyo, JP;

Naomasa Suzuki, Tokyo, JP;

Muneyuki Fukuda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); G06T 7/62 (2017.01); G06T 7/50 (2017.01); G06N 3/04 (2023.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G06N 3/04 (2013.01); G06T 7/50 (2017.01); G06T 7/62 (2017.01); H01J 37/222 (2013.01); G01N 2223/6116 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Provided is an image processing system capable of estimating a three-dimensional shape of a semiconductor pattern or a particle by solving problems of measurement reduction in a height direction and taking an enormous amount of time at a time of acquiring learning data. The image processing system according to the disclosure stores a detectable range of a detector provided in a charged particle beam device in a storage device in advance, generates a simulated image of a three-dimensional shape pattern using the detectable range, and learns a relationship between the simulated image and the three-dimensional shape pattern in advance.


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