The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Jan. 22, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Junichiro Nishida, Joetsu, JP;
Kazuo Shirota, Joetsu, JP;
Hisashi Yagi, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 21/00 (2006.01); C03B 23/04 (2006.01); C03B 25/02 (2006.01); C03C 23/00 (2006.01); C03B 19/14 (2006.01); C03B 32/00 (2006.01); C03C 3/06 (2006.01); C03C 4/00 (2006.01);
U.S. Cl.
CPC ...
C03C 21/007 (2013.01); C03B 19/1469 (2013.01); C03B 23/04 (2013.01); C03B 25/025 (2013.01); C03B 32/00 (2013.01); C03C 3/06 (2013.01); C03C 4/0071 (2013.01); C03C 23/002 (2013.01); C03C 23/007 (2013.01); C03B 2201/21 (2013.01); C03B 2201/23 (2013.01); C03C 2201/21 (2013.01); C03C 2203/52 (2013.01);
Abstract
A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.