The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2023
Filed:
Oct. 29, 2020
Applicant:
Hzo, Inc., Morrisville, NC (US);
Inventors:
Sean Clancy, Apex, NC (US);
Benjamin Lawrence, Salt Lake City, UT (US);
Alexander Niebroski, Fuquay-Varina, NC (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/00 (2006.01); H05K 3/22 (2006.01); H01J 37/32 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
H05K 3/0041 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); H01J 37/3244 (2013.01); H01J 37/32963 (2013.01); H05K 3/0023 (2013.01); H05K 3/22 (2013.01); H05K 2203/095 (2013.01);
Abstract
A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate.