The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Apr. 23, 2021
Applicant:

Deepmind Technologies Limited, London, GB;

Inventors:

Krishnamurthy Dvijotham, London, GB;

Anton Zhernov, London, GB;

Sven Adrian Gowal, Cambridge, GB;

Conrad Grobler, London, GB;

Robert Stanforth, Dorking, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 40/279 (2020.01); G06F 40/247 (2020.01); G06N 5/04 (2023.01); G06N 20/00 (2019.01); G06F 40/166 (2020.01);
U.S. Cl.
CPC ...
G06F 40/279 (2020.01); G06F 40/166 (2020.01); G06F 40/247 (2020.01); G06N 5/04 (2013.01); G06N 20/00 (2019.01);
Abstract

Methods, systems, and apparatus, including computer programs encoded on computer storage media, for training a text classification machine learning model. One of the methods includes training a model having a plurality of parameters and configured to generate a classification of a text sample comprising a plurality of words by processing a model input that includes a combined feature representation of the plurality of words in the text sample, wherein the training comprises receiving a text sample and a target classification for the text sample; generating a plurality of perturbed combined feature representations; determining, based on the plurality of perturbed combined feature representations, a region in the embedding space; and determining an update to the parameters based on an adversarial objective that encourages the model to assign the target classification for the text sample for all of the combined feature representations in the region in the embedding space.


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