The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2023
Filed:
Feb. 18, 2021
Kaunas University of Technology, Kaunas, LT;
Viktoras Grigaliunas, Kaunas, LT;
Sigitas Tamulevicius, Kaunas, LT;
Mindaugas Andrulevicius, Kaunas, LT;
Tomas Tamulevicius, Kauno raj., LT;
Egle Fataraite-Urboniene, Kaunas, LT;
Pranas Narmontas, Kaunas, LT;
Tomas Klinavicius, Kaunas, LT;
Dalius Jucius, Kaunas, LT;
Mindaugas Juodenas, Kaunas, LT;
Kaunas University of Technology, Kaunas, LT;
Abstract
Disclosed herein is a method that combines two different hologram origination processes in a single photoresist layer by using an interlayer to transfer structures exposed by electron beam lithography into overlapped with dot-matrix hologram areas, and fabricated holographic structures are replicated in multilayer polymer films. Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. The method allows combining these two technologies so that the final security device could contain electron beam patterned high resolution diffraction gratings, computer generated holograms, as well as dot-matrix laser patterned large hologram areas with high diffraction efficiency, providing an increased level of protection.