The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Oct. 08, 2019
Applicant:

Pilkington Group Limited, Lathom, GB;

Inventors:

Deborah Raisbeck, Burscough, GB;

Paul Andrew Skinner, Ashton-in-Makerfield, GB;

Hans-Eckhard Leitl, Weiden, DE;

Mark John Glynn, St. Helens, GB;

David Rimmer, St. Helens, GB;

Kevin David Sanderson, Maumee, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 17/34 (2006.01); C23C 16/30 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C03C 17/3435 (2013.01); C03C 17/3441 (2013.01); C23C 16/308 (2013.01); C23C 16/401 (2013.01); C03C 2217/211 (2013.01); C03C 2217/228 (2013.01); C03C 2217/94 (2013.01); C03C 2218/152 (2013.01);
Abstract

A chemical vapour deposition process for preparing a coated glass substrate, said process comprising at least the following steps in sequence: a) providing a glass substrate having a surface, b) depositing a layer based on SiCO and/or SiNO on the surface of the glass substrate, c) exposing the layer based on SiCO and/or SiNO to a gaseous mixture (i) comprising water, and d) subsequently depositing a layer based on a TCO over the layer based on SiCO and/or SiNO.


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