The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Mar. 03, 2021
Applicant:

University of South Florida, Tampa, FL (US);

Inventors:

Dharendra Yogi Goswami, Tampa, FL (US);

Dilip Neeraj Goswami, San Carlos, CA (US);

Assignees:

University of South Florida, Tampa, FL (US);

MOLEKULE, INC., San Francisco, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A62B 7/10 (2006.01); A61L 9/20 (2006.01); A62B 7/12 (2006.01); A62B 9/02 (2006.01); A62B 18/00 (2006.01); A62B 18/02 (2006.01); A62B 18/10 (2006.01); A62B 23/02 (2006.01); B01J 35/00 (2006.01); B01J 35/02 (2006.01);
U.S. Cl.
CPC ...
A62B 7/10 (2013.01); A61L 9/205 (2013.01); A62B 7/12 (2013.01); A62B 9/02 (2013.01); A62B 18/006 (2013.01); A62B 18/025 (2013.01); A62B 18/10 (2013.01); A62B 23/02 (2013.01); B01J 35/004 (2013.01); B01J 35/023 (2013.01); A61L 2209/111 (2013.01); A61L 2209/12 (2013.01); A61L 2209/14 (2013.01);
Abstract

A breathing system for removing harmful contaminants, such as microbes and volatile organic compounds, is provided. The breathing system includes a face mask, an inhalation limb, and a plasmonic device. As a contaminated gas flows through an internal chamber of the plasmonic device, the contaminates are oxidized. Specifically, the internal chamber includes a source of photons spaced apart from the nanostructure. The nanostructure is coated in a plasmonic layer, including noble metal nanoparticles. The plasmonic layer is protected from oxidation through a photocatalyst layer disposed thereon.


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