The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2023

Filed:

Sep. 09, 2021
Applicant:

Nichia Corporation, Anan, JP;

Inventor:

Ryota Funakoshi, Tokushima, JP;

Assignee:

NICHIA CORPORATION, Anan, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); H01L 33/32 (2010.01); H01L 33/02 (2010.01); H01L 33/08 (2010.01);
U.S. Cl.
CPC ...
H01L 33/025 (2013.01); H01L 33/007 (2013.01); H01L 33/0075 (2013.01); H01L 33/08 (2013.01); H01L 33/32 (2013.01);
Abstract

A nitride semiconductor element includes: a first light emission part that includes a first n-side semiconductor layer, a first active layer, and a first p-side semiconductor layer; a first layer that contains an n-type impurity of a first concentration, located on the first light emission part, and in contact with the first p-side semiconductor layer; a second layer that contains an n-type impurity of a second concentration, located on the first layer; and a second light emission part that includes a second n-side semiconductor layer located on the second layer, a second active layer, and a second p-side semiconductor layer. The second n-side semiconductor layer contains an n-type impurity of a third concentration. The first and second concentrations are higher than the third concentration. The first concentration is higher than the second concentration. A thickness of the second layer is larger than a thickness of the first layer.


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