The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Jun. 19, 2019
Applicant:
Jsw Aktina System Co., Ltd., Yokohama, JP;
Inventors:
Suk-Hwan Chung, Kanagawa, JP;
Masashi Machida, Kanagawa, JP;
Assignee:
JSW AKTINA SYSTEM CO., LTD, Yokohama, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/268 (2006.01); B23K 26/08 (2014.01); H01L 21/02 (2006.01); H01L 21/20 (2006.01); B23K 101/40 (2006.01); B23K 26/03 (2006.01); B23K 26/0622 (2014.01); B23K 26/12 (2014.01); B23K 26/352 (2014.01); B23K 26/00 (2014.01);
U.S. Cl.
CPC ...
H01L 21/268 (2013.01); B23K 26/08 (2013.01); H01L 21/02675 (2013.01); H01L 21/20 (2013.01); B23K 2101/40 (2018.08);
Abstract
Quality of a crystalline film is improved. In a method for manufacturing a panel, a polysilicon film is formed by emission of laser light to an amorphous silicon filmA through a light-transmittable memberthat can transmit the laser light.