The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Jun. 01, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Kanji Suzuki, Saitama, JP;
Manabu Hakko, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus configured to expose a substrate to light from a solid-state light emitting element, includes an illumination optical system configured to illuminate a mask with the light, and a projection optical system configured to project an image of a pattern of the mask onto the substrate, wherein a pupil plane intensity distribution, which is a light intensity distribution on a pupil plane included in the illumination optical system and optically conjugated with a light emission plane of the solid-state light emitting element, is a light intensity distribution in which a maximum intensity is achieved outside an optical axis of the illumination optical system, and wherein the pupil plane intensity distribution is a light intensity distribution on the pupil plane onto which a light emission distribution of the light emission plane is projected with a predetermined magnification.