The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Mar. 25, 2021
Leica Microsystems Cms Gmbh, Wetzlar, DE;
Kai Walter, Schriesheim, DE;
Lars Friedrich, Weinheim, DE;
LEICA MICROSYSTEMS CMS GMBH, Wetzlar, DE;
Abstract
A method for estimating a stimulated emission depletion microscopy (STED) resolution includes generating a first frame representing a reference image from a field-of-view, the reference image having a predetermined reference resolution, and generating at least one second frame representing a STED image from the same field-of-view, the STED image having the STED resolution to be estimated. The at least one second frame is blurred by applying a convolution kernel with at least one fit parameter to the second frame. An optimal value of the at least one fit parameter of the convolution kernel is determined for which a difference between the first frame and the blurred at least one second frame is minimized. The STED resolution is estimated based on the optimal value of the at least one fit parameter and the predetermined reference resolution.