The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2023
Filed:
Jan. 21, 2019
Okamoto Chemical Industry Co., Ltd., Warabi, JP;
Hiroaki Okamoto, Warabi, JP;
Masaro Nakatsuka, Warabi, JP;
Okamoto Chemical Industry Co., Ltd., Warabi, JP;
Abstract
Provided is a composition for optical stereolithography the stereolithography (photocuring) of which is completed in a shorter time and which provides a stereolithographic object having excellent strength (for example, strength that prevents the occurrence of a fracture and the like when the stereolithographic object is subjected to an impact or dropping, and strength that allows the stereolithographic object to withstand repeated folding). The composition for optical stereolithography of the present invention includes at least 2 to 40% by mass of (A1) a radical polymerizable compound of a dioxane (meth)acrylate, 5 to 40% by mass of (A2) a radical polymerizable compound of a bifunctional polyester-based urethane (meth)acrylate, 5 to 40% by mass of (A3) a radical polymerizable compound of a bifunctional polyether-based urethane (meth)acrylate, and 20 to 87% by weight of (A4) a radical polymerizable compound other than the (A1), (A2), and (A3), as (A) radical polymerizable compounds; 0.1 to 5% by mass of (B) a photopolymerization initiator; and 0.1 to 5% by mass of (C) a sensitizer.