The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2023

Filed:

Dec. 21, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Yoontae Hwang, Seoul, KR;

Wandon Kim, Seongnam-si, KR;

Geunwoo Kim, Seoul, KR;

Heonbok Lee, Suwon-si, KR;

Taegon Kim, Seoul, KR;

Hanki Lee, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/45 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/417 (2006.01); H01L 29/08 (2006.01); H01L 23/532 (2006.01); H01L 23/485 (2006.01); H01L 23/522 (2006.01); H01L 21/768 (2006.01); H01L 21/8234 (2006.01); H01L 29/06 (2006.01); H01L 29/775 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 29/45 (2013.01); H01L 21/28518 (2013.01); H01L 21/76805 (2013.01); H01L 21/76843 (2013.01); H01L 21/76859 (2013.01); H01L 21/76886 (2013.01); H01L 21/823431 (2013.01); H01L 23/485 (2013.01); H01L 23/5226 (2013.01); H01L 23/53266 (2013.01); H01L 29/0673 (2013.01); H01L 29/0847 (2013.01); H01L 29/41766 (2013.01); H01L 29/41791 (2013.01); H01L 29/42392 (2013.01); H01L 29/456 (2013.01); H01L 29/66795 (2013.01); H01L 29/775 (2013.01); H01L 29/7851 (2013.01); H01L 29/78696 (2013.01);
Abstract

A semiconductor device including a substrate; a fin active region on the substrate and extending in a first direction; a gate structure extending across the fin active region and extending in a second direction; a source/drain region in the fin active region on a side of the gate structure; an insulating structure covering the gate structure and the source/drain region; and contact structures penetrating through the insulating structure and respectively connected to the source/drain region and the gate structure, wherein one of the contact structures includes a seed layer on the gate structure or the source/drain regions and including lower and upper regions, the lower region having a first grain size and the upper region being amorphous or having a grain size different from the first grain size, and a contact plug on an upper region of the seed layer and having a second grain size.


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