The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2023

Filed:

Jul. 29, 2021
Applicant:

Applied Materials, Inc., Santa clara, CA (US);

Inventor:

Paul Z. Wirth, Kalispell, MT (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); F27D 3/00 (2006.01); F27D 5/00 (2006.01); F27D 11/02 (2006.01); F27D 21/00 (2006.01); H01L 21/324 (2006.01); F27D 19/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67103 (2013.01); F27D 3/0084 (2013.01); F27D 5/0037 (2013.01); F27D 11/02 (2013.01); F27D 19/00 (2013.01); F27D 21/0014 (2013.01); H01L 21/324 (2013.01); H01L 21/67248 (2013.01); F27D 2019/0003 (2013.01);
Abstract

A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.


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