The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Sep. 08, 2021
Samsung Display Co., Ltd., Yongin-si, KR;
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
Mann Ho Cho, Seoul, KR;
Kwang Sik Jeong, Seoul, KR;
Hyeon Sik Kim, Gumi-si, KR;
Hyun Eok Shin, Gwacheon-si, KR;
Byung Soo So, Yongin-si, KR;
Ju Hyun Lee, Seongnam-si, KR;
SAMSUNG DISPLAY CO., LTD., Seoul, KR;
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY, Yongin-si, KR;
Abstract
A method of manufacturing a stacked structure includes forming a first metal buffer layer including crystal grains on a base substrate, forming a second metal buffer material layer on the first metal buffer layer, and crystallizing the second metal buffer material layer to form a second metal buffer layer, wherein the second metal buffer material layer includes crystal grains, and a density of the crystal grains of the second metal buffer material layer is lower than a density of the crystal grains of the first metal buffer layer.