The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Jan. 04, 2017
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventor:
Takashi Kosho, Ibaraki, JP;
Assignee:
JX Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); G11B 5/65 (2006.01); G11B 5/851 (2006.01); H01F 10/14 (2006.01); H01F 41/18 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3429 (2013.01); C23C 14/06 (2013.01); C23C 14/3414 (2013.01); G11B 5/65 (2013.01); H01F 10/14 (2013.01); C23C 14/34 (2013.01); G11B 5/851 (2013.01); H01F 41/18 (2013.01);
Abstract
Provided is a sputtering target or a film which is characterized by containing 0.1 to 10 mol % of an oxide of one or more types selected from FeO, FeO, KO, NaO, PbO, and ZnO, 5 to 70 mol % of Pt, and the remainder being Fe. The present invention addresses the issue of providing a sputtering target capable of considerably reducing the particles caused by nonmagnetic materials and significantly improving the yield during deposition. It is thereby possible to deposit a quality magnetic recording layer and improve yield of a magnetic recording medium.